【内容简介】 Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information and book reviews. All papers are peer-reviewed in the usual Advanced Materials quality.
Chemists, physicists and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films and ceramic processing now have a unified forum for their work.
Editorial Office: Chemical Vapor Deposition Department of Pure and Applied Chemistry University of Strathclyde 295 Cathedral Street Glasgow G1 1XL, UK Phone: (+44) 141 553 4189 Fax: (+44) 141 548 4822 E-mail: m.l.hitchman@strath.ac.uk
