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[Adv. Mater. Interfaces] Water-Based Photo & Electron-Beam Lithography Using Egg White as a Resist
作者:Bojing Jiang, Jie Yang, Chen Li, Liangliang Zhang, Xu Zhang, Peng Yang
关键字:egg white, resist material, lithography, electron-beam, UV exposure
论文来源:期刊
具体来源:Advanced Materials Interfaces
发表时间:2017年

Complex lithographic steps and the use of toxic chemicals in these processes are in conflict with a sustainable human society. Development of new inexpensive and green resist, simple alternative procedures, and non-toxic solvents is the key to move recyclable micro/nano-fabrication from laboratory level to industrial application in large scale. Herein, precise control on protein fragmentation/aggregation upon photo/electron irradiation is conceived into egg white-based green resist for all-water-based photo/electron-lithography at sub-micron resolution. We acquire the egg white simply from chicken egg without additional complex purification steps. Photolithography and electron-beam direct writing on spin-coated egg white layer could generate geometrically complex micro/nano-patterns at a low irradiation dose of 3000 μC/cm2 and 1500 μC/cm2 for effective positive and negative pattern respectively. With further developing the patterned resist in chemical etching system, the resist pattern could be transferred onto underlying Si/SiO2/Au/Cu substrates with good fidelity and one egg could efficiently process five objects with two inches in diameter, demonstrating its practical implication in spatially definable micro/nano-processing of materials.


DOI: 10.1002/admi.201601223 In Press