Links
Contact Info.
  • Address:湖北省武汉市洪山区珞瑜路1037号
  • Zip:430074
  • Tel:027-87558194
  • Fax:027-87543032
  • Email:ygliao@mail.hust.edu.cn
Current Location :> Home > Publications > Text
相分离高分子共混薄膜退火和准淬火的原位原子力显微镜研究。
writer:廖永贵,由吉春,李学,孙昭艳,石彤非,安立佳。
keywords:高等学校化学学报,2005, 26(9): 1777-1779.
source:期刊
The morphology and phase shift of phase-separated PMMA/SAN thin film on silicon wafer were studied by in situ AFM with hot stage through the annealing and quasi-quenching. The results show that the phase shifts are different between high temperature and room temperature, and between ultrahigh vacuum and ambient and between in situ and ex situ although the morphologies are almost invariable. The reasons were discussed simply.